The aluminium coated substrates are available as Ø 4”/100mm silicon wafer, 10x10mm Si chips, microscope slide and 22x22x0.2 mm coverslip coated with 100nm pure aluminium (99.999%). They are useful for thin film research, experiments, microelectronics, optics, telecommunications, nanotechnology and biotechnology. Aluminium coatings exhibit high conductance, high reflectance and strong adhesion. The aluminium coating is deposited in a dedicated high vacuum deposition system using an electron beam source. The aluminium coating is not atomically flat; there are height differences in the nm range. For protection, the wafers are packed in wafer carrying trays, the slides are packed in slide mailers and the Si chips and coverslips are packed in Gel-Pak boxes.
Specifications of the Nano-Tec aluminum coated substrates:
Aluminium Coating |
100 nm |
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Adhesion film |
none |
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Surface roughness |
Several nm |
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Substrate |
Silicon wafer |
Si chips |
Microscope slide |
Coverslip |
Dimensions |
Ø 4” / 100 mm |
10 x 10 mm |
75x25 mm |
22x22 mm |
Thickness |
525 µm (+/- 20 µm |
1mm |
0.2mm |
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Material type |
P (Boron) - <100> - 1-30 Ohm/cm |
Borofloat 33 – borosilicate glass |
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