Nano-Tec Titanium Nitride coated silicon wafer and glass slide
titanium Nitride coated silicon wafer and glass slide


Introduction
Nano-Tec titanium nitride coated silicon and glass substrate
Nano-Tec titanium nitride coated microscope slide, 75x25x1 mm, 100nm

The titanium nitride coated substrates are available as Ø 4”/100mm silicon wafer and microscope slide, coated with 50nm pure Titanium Nitride (99.995%). Titanium Nitride (TiN) thin films have an excellent thermal and bio stability, strength, and resistance to corrosion under extreme conditions. TiN is often applied as an effective hard coating on steel, carbide, and aluminum components. It is also used to protect sliding surfaces, as a tribological layer for cutting tools, and is an excellent non-toxic coating found in biomedical devices. Thin film TiN is also used in microelectronics, serving as both a metal and silicon diffusion layer and an excellent conductive connection between active devices and metal contacts.
For this coating, an effective low-temperature method is used for depositing ultra-pure, highly dense, and conductive TiN (~ 50-70 µΩ·cm) thin films onto glass and silicon substrates. This is achieved using a new reactive Bipolar High Power Impulse Magnetron Sputtering (Bi-HiPIMS) technology. HiPIMS uses pulsed power at very high peak power density that yields a high ionization of sputtered species. A positive reverse voltage is applied immediately after the normal negative HiPIMS pulse (“Bipolar” HiPIMS) which accelerates these ions towards the substrate surface while simultaneously exposing them to reactive N2 gas. This ion bombardment on the surface of the growing film is essential for creating a high-quality and dense TiN coating without needing to rely on extreme temperatures often required for more traditional sputtering methods.. The titanium nitride coating is not atomically flat; there are height differences in the nm range. For protection, the wafers are packed in wafer carrying trays and the slides are packed in slide mailers.


Specifications of the Nano-Tec titanium nitride coated silicon wafer and microscope slide:

Titanium Nitride coating

50 nm TiN (99.995% purity)

Adhesion film

none

Surface roughness

Several nm

Substrate

Silicon wafer

Microscope slide

Dimensions

Ø 4” / 100 mm

75x25 mm

Thickness

525 µm (+/- 20 µm

1mm

Material type

P (Boron) -  <100> - 1-30 Ohm/cm

Borofloat 33 – borosilicate glass



Ordering information for Nano-Tec iridium coated silicon wafer and microscope slide

*Prices without VAT, but within the EU, we have to check for valid VAT-ID.
  
Nano-Tec titanium nitride coated silicon wafer, Ø4inch/100mm, 525µm thickness, 50nm TiN Nano-Tec titanium nitride coated silicon wafer, Ø4inch/100mm, 525µm thickness, 50nm TiN
Product # Unit Price* Add to Quote / Order
10-TN8140-3 Pkg/3 €1590,00
Qty:

 

Nano-Tec titanium nitride coated microscope slide, 75x25x1 mm, 50nm TiN Nano-Tec titanium nitride coated microscope slide, 75x25x1 mm, 50nm TiN
Product # Unit Price* Add to Quote / Order
10-TN8631-10 pkg/10 €1590,00
Qty:

 



SEM Supplies

TEM Supplies

Calibration

Sample Preparation

AFM / SPM

  Product Menu with Images
  SEM Sample Stubs
  Carbon Tabs
  Sample Stub Adapters
  SEM Stage Adapters
  SEM Sample Holders
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  Filaments / Cathodes
  Silicon Finder Grid
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Instruments

  Acoustic Enclosures
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  Diaphragm Pump
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Cryo Supplies

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FIB Supplies

  FIB Lift-out Grids
  FIB Low Profile Stubs
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  FIB Pre-tilt Holders
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  EDS / WDS Calibration
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Vacuum Supplies

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Sample Coating Supplies

  Sputter Targets
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Evaporation Supplies

  Thermal Evaporation Sources
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Light Microscopy

  Correlative Cover Slips
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